Microelectronics industrial cleanroom engineering is an industry with high requirements for clean rooms, just like the microelectronics industry itself. With the development of large scale integrated circuits (LSI) and VLS1, the requirements for dust control in microelectronics industrial cleanroom engineering are also increasing. In the IC manufacturing process, the higher the degree of integration, the thinner the graphic size (expressed as line width), the smaller the clean room controlled particle size (usually 1/10 of the line width), the lower the dust content. In addition, modern industrial liquid crystal, optical fiber production, cleanliness requirements for microelectronics industry cleanroom engineering is also very high.

The definition of microelectronic industrial cleanroom engineering is to eliminate dust particles, harmful air, bacteria and other pollutants from the air within a certain space, and to control the indoor temperature and humidity, cleanliness, indoor pressure, airflow speed and airflow distribution, noise and vibration, lighting, static electricity within a certain demand range, and the specially designed confined space.

Microelectronics industrial cleanroom project, also known as clean room or clean room, has been an important and indispensable facility for semiconductor, precision manufacturing, liquid crystal manufacturing, optical manufacturing, circuit board manufacturing, and biochemistry, pharmaceutical, and food manufacturing industries. Microelectronics industrial cleanroom project due to the innovative development of technology, for the product of high precision, fine miniaturization of the demand is more urgent, such as ultra-large integrated circuit research and manufacturing, has become the world's countries in the development of science and technology on the most important project.